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Optical proximity correction considering mask manufacturability and its application to 0.25-ヲフm DRAM for enhanced device performance

Author(s):
Park,C.-H. ( Samsung Electronics Co.,Ltd. )
Rhie,S.-U.
Choi,J.-H.
Park,J.-S.
Seo,H.-W.
Kim,Y.-H.
Park,Y.-K.
Han,W.-S.
Lee,W.-S.
Kong,J.-T.
5 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. date:
2000
Vol.:
Part2
Page(from):
1041
Page(to):
1046
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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