Accuracy of diffused aerial image model for full-chip-level optical proximity correction

Accuracy of diffused aerial image model for full-chip-level optical proximity correction

Author(s):

Hong,J.-S. ( Hyundai Electronics Industries Co.,Ltd. )

Publication title:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4000

Pub. Year:

2000

Vol.:

Part2

Page(from):

1024

Page(to):

1032

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

Language:

English

Call no.:

P63600/4000

Type:

Conference Proceedings

Details

TDL ID:	ZA00019438
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2000 : 13th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.03.01-2000.03.03

Similar Items:

1 Conference Proceedings Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography Yune,H.-S., Kim,H.-B., Kim,W.-H., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Validation of repair process for DUV attenuated phase-shift mask Paek,S.W., Kim,H.-B., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Exposure latitude analysis for dense line and space patterns by using diffused aerial image model Ahn,C.-N., Kim,H.-B., Baik,K.-H. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Mask critical dimension error on optical lithography Eom,T.-S., Koo,S.-S., Paek,S.-W., Kim,H.-B., Ahn,C.-N., Baik,K.-H. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Novel approximate model for resist process Ahn,C.-N., Kim,H.-B., Baik,K.-H. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Application of full-chip optical proximity correction for sub-60-nm memory device in polarized illumination H. Yune, Y. Ahn, D. Lee, J. Moon, B. Nam, D. Yim SPIE - The International Society of Optical Engineering	10 Conference Proceedings Optical proximity correction using a transmittance-controlled mask (TCM) W.-S. Han, C.-J. Sohn, Y.-B. Kim, K.-H. Kim, H.-K. Kang Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography Ham,Y.-M., Kim,S.-K., Kim,S.-J., Hur,C., Kim,Y.-S., Baik,K.-H., Kim,B.-H., Ahn,D.-J. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography Oh, S.-Y., Kim, W.-H., Yune, H.-S., Kim, H.-B., Kim, S.-M., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Study of optical proximity effects using off-axis illumination with attenuated phase shift mask C.-N. Ahn, K.-H. Baik, Y.-S. Lee, H.-E. Kim, I.-B. Hur Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Practical method for full-chip optical proximity correction Chen,J.F., Laidig,T., Wampler,K.E., Caldwell,R. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12