130-nm KrF lithography for DRAM production with 0.68-NA scanner

130-nm KrF lithography for DRAM production with 0.68-NA scanner

Author(s):

Publication title:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4000

Pub. Year:

2000

Vol.:

Part2

Page(from):

927

Page(to):

934

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

Language:

English

Call no.:

P63600/4000

Type:

Conference Proceedings

Details

TDL ID:	ZA00019438
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2000 : 13th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.03.01-2000.03.03

Similar Items:

1 Conference Proceedings Novel methodology for 130-nm DRAM cell mask size optimization Kanemitsu,H., Nagai,K., Asano,M., Sutani,T. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography Kim, Y.-S., You, T.J., Kim, J.-S., Kim, S.-K., Kong, K.-K., Kim, Y.-D., Kim, H.S. SPIE-The International Society for Optical Engineering
2 Conference Proceedings KrF lithography for 130 nm Finders,J., Schoot,J.B.van, Vanoppen,P., Dusa,M.V., Socha,R.J., Vandenberghe,G., Ronse,K. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Improvement of photomask repeater for 130-nm lithography Kyoh,S., Inoue,S., Mori,I., Irie,N., Ishii,Y., Umatate,T., Kokubo,H., Hayashi,N. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Printing 95-nm DRAM full chip patterns in KrF lithography Kim, S.-K., Kim, J.-S., Yoo, T.-J., Kong, K.-K., Yun, H.-S., Kim, Y.-D., Kim, H.-R., Kim, Y.-S., Kim, H.S. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography Matsunaga,T., Enami,T., Kakizaki,K., Saito,T., Tanaka,S., Nakarai,H., Inoue,T., Igarashi,T. SPIE-The International Society for Optical Engineering
4 Conference Proceedings 0.33-k1 ArF lithography for 100-nm DRAM Bok, C.K., Kim, S.-K., Kim, H.-B., Oh, J.-S., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering	10 Conference Proceedings RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography Hsu,S., Shi,X., Hsu,M., Corcoran,N.P., Chen,J.F., Desai,S., Sherrill,M.J., Tseng,Y.C., Chang,H.A., Kao,J.F., Tseng,A., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners Ebihara, T., Levenson, M.D., Liu, W., He, J., Yeh, W., Ahn, S., Oga, T., Shen, M., M'saad, H. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Intrafield critical dimension variation using KrF scanner system for 0.18-ｦﾌm lithography Yim,D., Kim,H.-S., Baik,K.-H. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era Kim, Y.-S., Hyun, Y.-S., Kong, K.-K., Kim, H., Choi, B.-H. SPIE - The International Society of Optical Engineering	12 Conference Proceedings 100-nm node lithography with KrF? Ferri,J.E., Tyrrell,B., Astolfi,D.K., Yost,D., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Liu,H.Y., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12