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Comparison study for sub-0.13-ヲフm lithography between ArF and KrF lithography

Author(s):
Kim,S.-K. ( Hyundai Electronics Industries Co.,Ltd. )
Kim,Y.-S.
Kim,J.-S.
Bok,C.-K.
Ham,Y.-M.
Baik,K.-H.
1 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. date:
2000
Vol.:
Part1
Page(from):
435
Page(to):
442
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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