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Status of ArF lithography for the 130-nm technology node

Author(s):
Ronse,K. ( IMEC )
Vandenberghe,G.
Jaenen,P.
Delvaux,C.
Vangoidsenhoven,D.
Roey,F.Van
Pollers,I.
Maenhoudt,M.
Goethals,A.M.
Pollentier,I.K.
Vleeming,B.
Schenau,K.van lngen
Heskamp,B.
Davies,G.
Niroomand,A.
10 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part1
Page(from):
410
Page(to):
422
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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