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Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Author(s):
Fritze,M. ( MIT Lincoln Lab. )
Burns,J.M.
Wyatt,P.W.
Astolfi,D.K.
Forte,T.
Yost,D.
Davis,P.
Curtis,A.V.
Preble,D.M.
Cann,S.G.
Denault,S.
Liu,H.-Y.
Shaw,J.C.
Sullivan,N.T.
Mastovich,M.E.
10 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part1
Page(from):
388
Page(to):
407
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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