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Customized illumination aperture filter for low k1 photolithography process

Author(s):
Gau,T.-S. ( Industrial Technology Research Institute )
Liu,R.-G.
Chen,C.-K.
Lai,C.-M.
Liang,F.-J.
Hsia,C.C.
1 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part1
Page(from):
271
Page(to):
282
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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