Phase aware proximity correction for advanced masks
- Author(s):
Toublan,O. ( Mentor Graphics Corp. ) Sahouria,E.Y. Cobb,N.B. Do,T. Donnelly,T. Granik,Y. Schellenberg,F.M. Schiavone,P. - Publication title:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4000
- Pub. Year:
- 2000
- Vol.:
- Part1
- Page(from):
- 160
- Page(to):
- 170
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- Language:
- English
- Call no.:
- P63600/4000
- Type:
- Conference Proceedings
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