An Atomic Force Microscopy and Ellipsometry Study of the Nucleation and Growth Mechanism of Polycrystalline Silicon Films on Silicon Dioxide

An Atomic Force Microscopy and Ellipsometry Study of the Nucleation and Growth Mechanism of Polycrystalline Silicon Films on Silicon Dioxide

Author(s):

Publication title:

Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

525

Pub. Year:

1998

Page(from):

199

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994317 [1558994319]

Language:

English

Call no.:

M23500/525

Type:

Conference Proceedings

Details

TDL ID:	ZA00019382
Series ID:	PA00000011
Conf. info. (Name):	Symposium on rapid thermal and integrated processing
Conf. info. (Number):	7th
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1998.04.13-1998.04.14

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