Low-Pressure CVD Growth of AlxTi1-xN Films With Tetrakis-(Dimethylamido)Titanium(TDMAT) and Dimethylaluminumhydride (DMAH) Precursors

Low-Pressure CVD Growth of AlxTi1-xN Films With Tetrakis-(Dimethylamido)Titanium(TDMAT) and Dimethylaluminumhydride (DMAH) Precursors

Author(s):

Sun, Y-M.

Publication title:

Chemical aspects of electronic ceramics processing : symposium held November 30-December 4, 1997, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

495

Pub. Year:

1998

Page(from):

165

Pub. info.:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994003 [1558994009]

Language:

English

Call no.:

M23500/495

Type:

Conference Proceedings

Details

TDL ID:	ZA00019379
Series ID:	PA00000011
Conf. info. (Name):	Symposium on chemical aspects of electronic ceramics processing
Conf. info. (Number):	1997
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1997.11.30-1997.12.04

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