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Precursors for the Chemical Vapor Deposition of Titanium Nitride and Titanium Aluminum Nitride Films

Author(s):
Publication title:
Chemical aspects of electronic ceramics processing : symposium held November 30-December 4, 1997, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
495
Pub. date:
1998
Page(from):
95
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994003 [1558994009]
Language:
English
Call no.:
M23500/495
Type:
Conference Proceedings

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