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SUPPRESSION OF SELF-INTERSTITIALS IN SILICON DURING ION IMPLANTATION VIA IN-SITU PHOTOEXCITATION

Author(s):
Ravi, J.
Erokhin, Yu.
Christensen, K.
Rozgonyi, G. A.
Patnaik, B. K.
White, C. W.
1 more
Publication title:
Microstructure of irradiated materials : Symposium held November 29-1 December, 1994, Boston, Massachusetts USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
373
Pub. Year:
1995
Page(from):
475
Pub. info.:
Pittsburgh, Pa: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992757 [1558992758]
Language:
English
Call no.:
M23500/373
Type:
Conference Proceedings

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