Process monitoring using surface charge profiling(SCP)method

Process monitoring using surface charge profiling(SCP)method

Author(s):

Ruzyllo,J. ( The Pennsylvania State Univ. )
Roman,P.
Staffa,J.
Kashkoush,I.
Kamieniecki,E.

Publication title:

Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2876

Pub. Year:

1996

Page(from):

162

Page(to):

173

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422743 [0819422746]

Language:

English

Call no.:

P63600/2876

Type:

Conference Proceedings

Details

TDL ID:	ZA00019346
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Process, Equipment, and Materials Control in Integrated Circuit Manufacturing
Conf. info. (Number):	1996 : 2nd
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1996.10.16-1996.10.17

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