Limits to etch resistance for 193-nm single-layer resists
- Author(s):
Kunz,R.R. ( MIT Lincoln Lab. ) Palmateer,S.C. Forte,A.R. Allen,R.D. Wallraff,G.M. DiPietro,R.A. Hofer,D.C. - Publication title:
- Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2724
- Pub. Year:
- 1996
- Page(from):
- 365
- Page(to):
- 376
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421005 [0819421006]
- Language:
- English
- Call no.:
- P63600/2724
- Type:
- Conference Proceedings
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