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Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes)containing acetal groups

Author(s):
Park,J.-H. ( Korea Kumho Petrochemical Co.,Ltd. )
Kim,S.-J.
Kim,J.-H.
Seo,D.-C.
Kim,K.-D.
Park,S.-Y.
Lee,H.
2 more
Publication title:
Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2724
Pub. Year:
1996
Page(from):
287
Page(to):
295
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421005 [0819421006]
Language:
English
Call no.:
P63600/2724
Type:
Conference Proceedings

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