Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials

Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials

Author(s):

Zanella,P.

Publication title:

Advanced materials and processes, YUCOMAT II : proceedings of the second Yugoslav Conference on Advanced Materials, held at Herceg - Novi, Yugoslavia, September 15-19, 1997

Title of ser.:

Materials science forum

Ser. no.:

282-283

Pub. Year:

1998

Page(from):

123

Page(to):

130

Pub. info.:

Zuerich, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878498123 [0878498125]

Language:

English

Call no.:

M23650

Type:

Conference Proceedings

Details

TDL ID:	ZA00019292
Series ID:	PA00000012
Conf. info. (Name):	YUCOMAT : Yugoslav Conference on Advanced Materials
Conf. info. (Number):	1997 : 2nd
Conf. info. (Venue):	Herceg-Novi, Yugoslavia
Conf. info. (Date):	1997.09.15-1997.09.19

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