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Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL

Author(s):
  • Babin,S.V. ( Set-Service (Russia) )
  • Hudek,P. ( Institute of Computer Systems (Slovak Republic) )
  • Kostic,I. ( Institute of Computer Systems (Slovak Republic) )
  • Kuzmin,I.Yu. ( Set-Service (Russia) )
Publication title:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3331
Pub. Year:
1998
Page(from):
655
Page(to):
661
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
Language:
English
Call no.:
P63600/3331
Type:
Conference Proceedings

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