Fabrication and testing of optics for EUV projection lithography
- Author(s):
- Taylor,J.S. ( Lawrence Livermore National Lab. )
- Sommargren,G.E. ( Lawrence Livermore National Lab. )
- Sweeney,D.W. ( Lawrence Livermore National Lab. )
- Hudyma,R.M. ( Lawrence Livermore National Lab. )
- Publication title:
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3331
- Pub. Year:
- 1998
- Page(from):
- 580
- Page(to):
- 590
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427762 [0819427764]
- Language:
- English
- Call no.:
- P63600/3331
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
High-power source and illumination system for extreme ultraviolet lithography
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Development of dioptric projection lenses for DUV lithography (Invited Paper)
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Overview of optical systems for 30-nm-resolution lithography at EUV wavelenghts (Invited Paper)
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution
SPIE-The International Society for Optical Engineering |