Linewidth controllability depending on electron-beam blur and resist thickness

Linewidth controllability depending on electron-beam blur and resist thickness

Author(s):

Itoh,M. ( Toshiba Corp. (Japan) )
Ando,A. ( Toshiba Corp. (Japan) )
Magoshi,S. ( Toshiba Corp. (Japan) )
Hattori,K. ( Toshiba Corp. (Japan) )

Publication title:

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3331

Pub. Year:

1998

Page(from):

442

Page(to):

449

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427762 [0819427764]

Language:

English

Call no.:

P63600/3331

Type:

Conference Proceedings

Details

TDL ID:	ZA00019241
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	1998 : 2nd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

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