100-nm CMOS gates patterned with 3ヲメbelow 10 nm
- Author(s):
Liu,H.Y. ( Hewlett-Packard Labs. ) Diaz,C.H. ( Hewlett-Packard Labs. ) Chi,C. ( Hewlett-Packard Labs. ) Kavari,R. ( Hewlett-Packard Labs. ) Cheng,P. ( Intel Corp. ) Cao,M. ( Hewlett-Packard Labs. ) Gleason,R.E. ( Hewlett-Packard Labs. ) Doyle,B.S. ( Intel Corp. ) Greene,W. ( Hewlett-Packard Labs. ) Ray,G. ( Hewlett-Packard Labs. ) - Publication title:
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3331
- Pub. Year:
- 1998
- Page(from):
- 375
- Page(to):
- 381
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427762 [0819427764]
- Language:
- English
- Call no.:
- P63600/3331
- Type:
- Conference Proceedings
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