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Development of SiO2/c-Si bilayer e-beam resist process and its application for 10-nm-scale MIM junctions

Author(s):
Gorwadkar,S. ( Electrotechnical Lab. (Japan) and New Energy and Industrial Technology Development Organization (Japan) )
Wada,T. ( Electrotechnical Lab. (Japan) )
Shirakashi,J. ( Electrotechnical Lab. (Japan) )
Hiroshima,H. ( Electrotechnical Lab. (Japan) )
Ishii,K. ( Electrotechnical Lab. (Japan) )
Komuro,M. ( Electrotechnical Lab. (Japan) )
1 more
Publication title:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3331
Pub. Year:
1998
Page(from):
359
Page(to):
368
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
Language:
English
Call no.:
P63600/3331
Type:
Conference Proceedings

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