New family of non-chemically amplified resists
- Author(s):
Aviram,A. ( IBM Thomas J. Watson Research Ctr. ) Angelopoulos,M. ( IBM Thomas J. Watson Research Ctr. ) Babich,E.D. ( IBM Thomas J. Watson Research Ctr. ) Babich,I.V. ( IBM Thomas J. Watson Research Ctr. ) Petrillo,K. ( IBM Thomas J. Watson Research Ctr. ) Seeger,D.E. ( IBM Thomas J. Watson Research Ctr. ) - Publication title:
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3331
- Pub. Year:
- 1998
- Page(from):
- 349
- Page(to):
- 358
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427762 [0819427764]
- Language:
- English
- Call no.:
- P63600/3331
- Type:
- Conference Proceedings
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