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Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication

Author(s):
Brooks,C.J. ( Lockheed Martin Federal Systems and IBM Microelectronics Div. )
Benoit,D.E. ( Lockheed Martin Federal Systems and IBM Microelectronics Div. )
Racette,K.C. ( Lockheed Martin Federal Systems and IBM Microelectronics Div. )
Puisto,D.M. ( Lockheed Martin Federal Systems and IBM Microelectronics Div. )
Whig,R. ( Motorola )
Dauksher,W.J. ( Motorola )
Cummings,K.D. ( Motorola )
2 more
Publication title:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3331
Pub. Year:
1998
Page(from):
255
Page(to):
260
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
Language:
English
Call no.:
P63600/3331
Type:
Conference Proceedings

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