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Beamline for measurement and characterization of multilayer optics for EUV lithography

Author(s):
  • Underwood,J.H. ( Lawrence Berkeley National Lab. and Univ.of California/Berkeley )
  • Gullikson,E.M. ( Lawrence Berkeley National Lab. and Univ.of California/Berkeley )
Publication title:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3331
Pub. date:
1998
Page(from):
52
Page(to):
61
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
Language:
English
Call no.:
P63600/3331
Type:
Conference Proceedings

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