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Furnace annealing of ion implanted polycrystalline silicon

Author(s):
  • Tandon, J.L. ( Department of Communication and Electronic Engineering, RMIT )
  • Harrison, H.B. ( Department of Communication and Electronic Engineering, RMIT )
  • Neoh, C.L. ( Department of Communication and Electronic Engineering, RMIT )
  • Short, K.T. ( Department of Communication and Electronic Engineering, RMIT )
  • Williams, J.S. ( Department of Communication and Electronic Engineering, RMIT )
Publication title:
Grain boundaries in semiconductors : proceedings of the Materials Research Society annual meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposia proceedings
Ser. no.:
5
Pub. date:
1982
Page(from):
317
Page(to):
323
Pub. info.:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444006974 [0444006974]
Language:
English
Call no.:
M23500/5
Type:
Conference Proceedings

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