Dry plasma etching of GaAs vias using BCl3/Ar and Cl2/Ar plasmas

Dry plasma etching of GaAs vias using BCl3/Ar and Cl2/Ar plasmas

Author(s):

Chen,Y.W. ( Nanyang Technological Univ. )
Ooi,B.S.
Ng,G.I.
Tan,C.L.
Chan,Y.C.

Publication title:

Design, fabrication, and characterization of photonic devices : 30 November-3 December 1999, Singapore

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3896

Pub. Year:

1999

Page(from):

199

Page(to):

206

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434982 [0819434981]

Language:

English

Call no.:

P63600/3896

Type:

Conference Proceedings

Details

TDL ID:	ZA00019022
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Photonics and Applications : Design, fabrication, and characterization of photonic devices
Conf. info. (Number):	1999
Conf. info. (Venue):	Singapore
Conf. info. (Date):	1999.11.30-1999.12.03

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