Yield improvement program using in-situ particle monitoring for particle reduction on a Semitool Magnum based on process control and process optimization

Yield improvement program using in-situ particle monitoring for particle reduction on a Semitool Magnum based on process control and process optimization

Author(s):

Vogels,L.J.P. ( Philips Semiconductors )
Dohmen,M.W.C.
Duijvenboden,P.van
Latimer,R.A.
Heffernan,J.D.O.

Publication title:

In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3743

Pub. Year:

1999

Page(from):

267

Page(to):

272

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819432230 [0819432237]

Language:

English

Call no.:

P63600/3743

Type:

Conference Proceedings

Details

TDL ID:	ZA00019008
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing Technologies : In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing
Conf. info. (Number):	1999
Conf. info. (Venue):	Edinburgh, Scotland
Conf. info. (Date):	1999.05.19-1999.05.21

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