0.18-ｦﾌm lithography strategies:248-nm DUV step-and-scanner and advanced chemical amplified resist

0.18-ｦﾌm lithography strategies:248-nm DUV step-and-scanner and advanced chemical amplified resist

Author(s):

Lin,Q.Y. ( Chartered Semiconductor Manufacturing Ltd. )
Cheng,A.
Ma,W.W.
Cheng,J.J.

Publication title:

Optical microlithography XII : 17-19 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3679

Pub. Year:

1999

Vol.:

Part2

Page(from):

942

Page(to):

952

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431530 [0819431532]

Language:

English

Call no.:

P63600/3679

Type:

Conference Proceedings

Details

TDL ID:	ZA00019002
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	1999 : 12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.17-1999.03.19

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