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Illumination condition and mask bias for 0.15-ヲフm pattern with KrF and ArF lithography

Author(s):
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. date:
1999
Vol.:
Part2
Page(from):
860
Page(to):
871
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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