Design of illumination aperture for ArF exposure system with wide exposing latitude
- Author(s):
Choi,S.-S. ( Electronics and Telecommunications Research Institute ) Cha,H.S. Kim,J.-S. Lee,K.H. Kim,D.H. Chung,H.B. Kim,D.Y. - Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part2
- Page(from):
- 792
- Page(to):
- 799
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
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