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ArF step-and-scan exposure system for 0.15-ヲフm and 0.13-ヲフm technology nodes

Author(s):
Mulkens,J. ( ASM Lithography BV )
Stoeldraijer,J.M.
Davies,G.
Dierichs,M.
Heskamp,B.
Moers,M.H.
George,R.A.
Roempp,O.
Glatzel,H.
Wagner,C.
Pollers,I.
Jaenen,P.
7 more
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. date:
1999
Vol.:
Part1
Page(from):
506
Page(to):
521
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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