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Customized off-axis illumination aperture filtering for sub-0.18-ヲフm KrF Lithography

Author(s):
Hsia,C.-C. ( Industrial Technology Research Institute )
Gau,T.-S.
Yang,C.-H.
Liu,R.-C.
Chang,C.-H.
Chen,L.-J.
Wang,C.-M.
Chen,J.F.
Smith,B.W.
Hwang,G.-W.
Lay,J.-W.
Goang,D.-Y.
7 more
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. date:
1999
Vol.:
Part1
Page(from):
427
Page(to):
434
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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