Flare impact on the intrafield CD control for sub-0.25-ヲフm patterning
- Author(s):
- Luce,E. ( STMicroelectronics )
- Minghetti,B.
- Schiavone,P.
- Toublan,O.
- Weill,A.P.
- Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 368
- Page(to):
- 381
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ヲフm gate printing
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Latitude of the BAR process compared to the monolayer and TAR processes for 0.35-ヲフm design rules at gate level
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Implementation of a closed-loop CD and overlay controller for sub-0.25-ヲフm patterning
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |
9
Conference Proceedings
NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ヲフm and sub-0.25-ヲフm critical levels
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Characterization and optimization of CD control for 0.25-ヲフm CMOS applications
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Performance of an i-line step-and-scan system for sub-0.25-ヲフm mix-and-match applications
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Meeting advanced pattern inspection system requirements for 0.25-ヲフm technology and beyond
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |