Optical extension at the 193-nm wavelength
- Author(s):
Zandbergen,P. ( International SEMATECH ) McCallum,M. Amblard,G.R. Domke,W.-D. Smith,B .W. Zavyalova,L. Petersen,J.S. - Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 310
- Page(to):
- 319
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Resolution and DOF improvement through the use of square-shaped illumination
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Design and development of thin film materials for 157-nm and VUV wavelengths:APSM,binary masking,and optical coatings applications
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Correction of 157-nm lens based on phase ring aberration extraction method
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Aberration evaluation and tolerancing of 193-nm lithographic objective lenses
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
SPIE-The International Society for Optical Engineering |