Challenge to sub-0.1-ヲフm pattern fabrication using an alternating phase-shifting mask in ArF lithography
- Author(s):
- Matsuo,T. ( Semiconductor Leading Edge Technologies,Inc. )
- Nakazawa,K.
- Ogawa,T.
- Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 302
- Page(to):
- 309
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
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