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Impact of mask errors on full chip error budgets

Author(s):
Schellenberg,F.M. ( Mentor Craphics )
Boksha,V.V.
Cobb,N.B.
Lai,J.C.
Chen,C.H.
Mack,C.A.
1 more
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. Year:
1999
Vol.:
Part1
Page(from):
261
Page(to):
275
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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