Matching simulation and experiment for chemically amplified resists
- Author(s):
- Mack,C.A. ( FINLE Technologies,Inc. )
- Ercken,M.
- Moelants,M.
- Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 183
- Page(to):
- 192
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Examination of a simplified reaction-diffusion model for post-exposure bake of chemically amplified resists
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Characterization and modeling of a positive-acting chemically amplified resist
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Diffusivity measurements in polymers:IV.Acid diffusion in chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Effect of developer temperature and normality on conventional and chemically amplified photoresist dissolution
SPIE - The International Society for Optical Engineering |
American Chemical Society |
11
Conference Proceedings
Progress in qualifying and quantifying the airborne base sensitivity of modern chemically amplified DUV photoresists
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Resist metrology for lithography simulation,part 2:development parameter measurements
SPIE-The International Society for Optical Engineering |