Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
- Author(s):
Kling,M.E. ( Motorola ) Cave,N. Falch,B.J. Fu,C.-C. Green,K.G. Lucas,K.D. Roman,B.J. Reich,A.J. Sturtevant,J.L. Tian,R. Russell,D.R. Karklin,L. Wang,Y.-T. - Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 10
- Page(to):
- 17
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
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