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Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Author(s):
Kling,M.E. ( Motorola )
Cave,N.
Falch,B.J.
Fu,C.-C.
Green,K.G.
Lucas,K.D.
Roman,B.J.
Reich,A.J.
Sturtevant,J.L.
Tian,R.
Russell,D.R.
Karklin,L.
Wang,Y.-T.
8 more
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. date:
1999
Vol.:
Part1
Page(from):
10
Page(to):
17
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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