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193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers

Author(s):
Sooriyakumaran,R. ( IBM Almaden Research Ctr. )
Fenzel-Alexander,D.
Brock,P.J.
Larson,C.E.
DiPietro,R.A.
Wallraff,G.M.
Hofer,D.C.
Dawson,D.J.
Mahorowala,A.P.
Angelopoulos,M.
5 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part2
Page(from):
1171
Page(to):
1180
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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