Improvement of resist profile roughness in bilayer resist process

Improvement of resist profile roughness in bilayer resist process

Author(s):

Jeong,C.-Y. ( Hyundai Electronics Industries Co.,Ltd. )

Publication title:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3999

Pub. Year:

2000

Vol.:

Part2

Page(from):

818

Page(to):

826

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

Language:

English

Call no.:

P63600/3999

Type:

Conference Proceedings

Details

TDL ID:	ZA00018975
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2000 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.02.28-2000.03.01

Similar Items:

1 Conference Proceedings Resist cracking and adhesion improvement Lee, I.-H., Lee, J.-S., Lee, K.-Y., Park, C.-G., Choi, J.-S., Lee, J. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Impact of mask defect in a high MEEF process Jeong, C.-Y., Park, K.-Y., Choi, J.S., Lee, J.G., Lee, D.-H. SPIE-The International Society for Optical Engineering
2 Conference Proceedings CD-SEM calibration with TEM to reduce CD measurement error Jeong, C.-Y., Lee, J., Park, K.-Y., Lee, W.G., Lee, D.-H. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Fabrication of Oxide/Semiconducting Coaxial Nanotubular Materials Using Atomic Layer Deposition Jeong, D.K., Park, N.H., Jung, S.H., Jung, W.G., Shin, H., Lee, J.G., Kim, J.Y. Trans Tech Publications
3 Conference Proceedings 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process Park, D.-I., Seo, S.-K., Park, E.-S., Lee, J.-H., Jeong, W.-G., Kim, J.-M., Choi, S.-S., Jeong, S.-H. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Comparative evaluation of mask production CAR development processes with stepwise defect inspection Jeong, W.-G., Lee, J.-K., Park, D.I., Park, E.-S., Lee, J.-H., Seo, S.-K., Lee, D.-H., Kim, J.-M., Choi, S.S., Jeong, … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Characterization of resist flow process for the improvement of contact hole CD uniformity Koh, C.-W., Lee, D.-H., Kim, M.-S., Park, S.-N., Kwon, W.-T. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Comparison of ArF bilayer resists for sub-90 nm L/S fabrication Hong, J., Kim, H.-W., Lee, S.-H., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Optimum PEC conditions under resist heating effect reduction for 90-nm-node mask writing Park, E.S., Lee, J.H,, Park, D.I., Jeong, W.-G., Seo, S.K., Kim, S.-S., Choi, S.-S., Jeong, S.-H. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Defects analysis of mask blanks Lee,D.H., Kim,D.W., Lee,J.K., Jeong,W.G., Choi,S.-S., Jung,S.-M., Jeong,S.-H. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process Jeong, W.-G., Kim, D.-W., Park, C.-M., An, K.-W., Lee, D.-H., Kim, J.-M., Choi, S.-S., Jeong, S.H. SPIE-The International Society for Optical Engineering	12 Conference Proceedings The study of defect control and patterning performance for top coating free resist process M.-S. Kim, H.-R. Jung, H.-W. Ryu, H.-G. Lee, S.-M. Hong Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12