New materials for 157-nm photoresists characterization and properties
- Author(s):
Crawford,M.K. ( DuPont Central Research & Development ) Feiring,A.E. Feldman,J. French,R.H. Periyasamy,M.P. III,F.L.Schadt Smalley,R.J. Zurnsteg,F.C. Kunz,R.R. Rao,V. Liao,L. Holl,S.M. - Publication title:
- Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3999
- Pub. Year:
- 2000
- Vol.:
- Part1
- Page(from):
- 357
- Page(to):
- 364
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436177 [0819436178]
- Language:
- English
- Call no.:
- P63600/3999
- Type:
- Conference Proceedings
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