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New materials for 157-nm photoresists characterization and properties

Author(s):
Crawford,M.K. ( DuPont Central Research & Development )
Feiring,A.E.
Feldman,J.
French,R.H.
Periyasamy,M.P.
III,F.L.Schadt
Smalley,R.J.
Zurnsteg,F.C.
Kunz,R.R.
Rao,V.
Liao,L.
Holl,S.M.
7 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part1
Page(from):
357
Page(to):
364
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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