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ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability

Author(s):
Lee,G. ( Hyundai Electronics Industries Co.,Ltd. )
Koh,C.-W.
Hong,S.-E.
Jung,J.-C.
Jung,M.-H.
Kim,H.-S.
Baik,K.-H.
2 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part1
Page(from):
13
Page(to):
22
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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