Application of Supercomputers To Model Fluid Transport and Chemical Kinetics in Chemical Vapor Deposition Reactors

Application of Supercomputers To Model Fluid Transport and Chemical Kinetics in Chemical Vapor Deposition Reactors

Author(s):

Publication title:

Supercomputer research in chemistry and chemical engineering

Title of ser.:

ACS symposium series

Ser. no.:

353

Pub. Year:

1987

Page(from):

334

Pub. info.:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841214309 [0841214301]

Language:

English

Call no.:

A05800/353

Type:

Conference Proceedings

Details

TDL ID:	ZA00018940
Series ID:	PA00000004
Conf. info. (Name):	Industrial and Engineering Chemistry Winter Symposium
Conf. info. (Number):	1987
Conf. info. (Venue):	Minneapolis, MN, USA
Conf. info. (Date):	1987.03.16-1987.03.17

Similar Items:

1 Conference Proceedings *LASER PROBES AND NUMERICAL MODELING AS PROCESS DIAGNOSTICS IN CHEMICAL VAPOR DEPOSITION Breiland, William G., Ho, Pauline, Coltrin, Michael E,, Kee, Robert J., Evans, Greg H. Materials Research Society	7 Conference Proceedings Balancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions of ZrO, HfO2, and SnO2 Gladfelter, W., Xia, B., Chen, F., Campbell, S., Roberts, J. Electrochemical Society
2 Conference Proceedings THEORETICAL ANALYSIS OF A ROTATING-DISK CHEMICAL VAPOR DEPOSITION REACTOR Coltrin, Michael E., Breiland, William G., Evans, Gregory H., Kee, Robert J. American Institute of Chemical Engineers	8 Conference Proceedings Numerical Modelling of Diamond Chemical Vapor Deposition (Invited) Coltrin, M.E., Dandy, D.S. American Institute of Chemical Engineers
3 Conference Proceedings Chemical Kinetics Models for Semiconductor Processing Coltrin, Michael E., Meeks, Ellen, Grcar, Joseph F., Houf, William G., Kee, Robert J., Creighton, J. Randall MRS - Materials Research Society	9 Conference Proceedings GAS-PHASE SILICON ATOM DENSITIES IN THE CHEMICAL VAPOR DEPOSITION OF SILICON FROM SILANE Coltrin, Michael E., Breiland, William G., Ho, Pauline MRS - Materials Research Society
4 Conference Proceedings A METHEMATICAL MODEL OF THE GAS-PHASE AND SURFACE CHEMISTRY IN GaAs MOCVD Coltrin, Michael E., Kee, Robert J. Materials Research Society	10 Conference Proceedings Modeling approaches for Rapid Thermal Chemical Vapor Deposition: combining transport phenomena with chemical kinetics Jensen F. K., Simka H., Mihopoulos G. T., Futerko P., Hierlemann M. Kluwer Academic Publishers
5 Conference Proceedings MODELS OF TRANSPORT, GAS-PHASE, AND SURFACE CHEMISTRY IN DIAMOND CHEMICAL VAPOR DEPOSITION Dandy, D.S., Coltrin, M.E. Electrochemical Society	11 Conference Proceedings Modeling of Transport Phenomena and Detailed Chemistry in Chemical Vapor Deposition Equipment Kuijlaars, K.J., Kleijn, C.R., van den Akker, H.E.A. Electrochemical Society
6 Conference Proceedings THEORETICAL MODELING AND LASER DIAGNOSTICS OF SILICON CHEMICAL VAPOR DEPOSITION Coltrin, Michael. E., Breiland, William. G., Ho, Pauline American Institute of Chemical Engineers	12 Conference Proceedings Multi-Dimensional Modeling of Thermal Batteries Using the Stefan-Maxwell Formulation and the Finite- Element Method Chen, Ken S., Evans, Greg H., Larson, Rich S., Coltrin, Mike E., Newman, John Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12