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The Effect of Impurities in Thin Film When Used as MOS Gate Electrodes

Author(s):
Yang, H.
Hu, J. C.
Lu, J. P.
Brown, G. A.
Rotondara, A. L. P.
Luttmer, J. D.
Magel, L. K.
Liu, H-Y.
Chen, P. J.
4 more
Publication title:
Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
514
Pub. Year:
1998
Page(from):
343
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994201 [1558994203]
Language:
English
Call no.:
M23500/514
Type:
Conference Proceedings

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