Enlarged Parameter Space by Use of VHF-GD for Deposition of Thin <p> Type ｦﾌc-Si:H Films

Enlarged Parameter Space by Use of VHF-GD for Deposition of Thin <p> Type ｦﾌc-Si:H Films

Author(s):

Publication title:

Advances in microcrystalline and nanocrystalline semiconductors, 1996 : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

452

Pub. Year:

1997

Page(from):

767

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993563 [1558993568]

Language:

English

Call no.:

M23500/452

Type:

Conference Proceedings

Details

TDL ID:	ZA00018911
Series ID:	PA00000011
Conf. info. (Name):	Symposium on advances in microcrystalline and nanocrystalline semiconductors
Conf. info. (Number):	1996
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1996.12.02-1996.12.06

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