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Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source

Author(s):
Constantine, C.
Johnson, D.
Barratt, C.
Shul, R. J.
McClellan, G. B.
Briggs, R. D.
Rieger, D. J.
Karlicek, R. F., Jr.
Lee, J. W.
Pearton, S. J.
5 more
Publication title:
Compound semiconductor electronics and photonics : symposium held April 8-10, 1996, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
421
Pub. date:
1996
Page(from):
431
Pub. info.:
Pittsburgh, Penn: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993242 [155899324X]
Language:
English
Call no.:
M23500/421
Type:
Conference Proceedings

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