Manufacturing sensitivity analysis of a 0.18-ｦﾌm NMOSFET

Manufacturing sensitivity analysis of a 0.18-ｦﾌm NMOSFET

Author(s):

Angelo,D. ( Univ.of Texas/Austin )

Publication title:

Microelectronic Device and Multilevel Interconnection Technology II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2875

Pub. Year:

1996

Page(from):

136

Page(to):

145

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422736 [0819422738]

Language:

English

Call no.:

P63600/2875

Type:

Conference Proceedings

Details

TDL ID:	ZA00018883
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Microelectronic Device and Multilevel Interconnection Technology
Conf. info. (Number):	1996 : 2nd
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1996.10.16-1996.10.17

Similar Items:

1 Conference Proceedings Design of 0.18-micron NMOSFETs for low-power applications Khan,S.A., Hareland,S.A., Tasch,A.F., Maziar,C.M., Zeitzoff,P. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Optimized shallow trench isolation for sub-0.18-ｦﾌm ASIC technologies Nouri,F., Laparra,O., Sur,H., Saha,S., Pramanik,D., Manley,M. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Design,reticle,and wafer OPC manufacturability for the 0.18-ｦﾌm lithography generation Lucas,K.D., McCallum,M., Falch,B.J., Wood,J.L., Kalk,F.D., Henderson,R.K., Russell,D.R. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Aberration effects in the region of 0.18-ｦﾌm lithography with KrF excimer stepper Yim,D., Lim,C.-M., Kim,H.-S., Baik,K.-H. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Analysis of Copper and Low-K Dielectric Interconnect System for 0.18-ｦﾌm Technology Lin, X. W., Hui, K., Chanderhari, K., Bothra, S., Pramanik, D., Findley, P. MRS - Materials Research Society	9 Conference Proceedings OPC beyond 0.18 ｦﾌm:OPC on PSM gates Schellenberg,F.M., Toublan,O., Cobb,N.B., Sahouria,E.Y., Hughes,G.P., MacDonald,S.S., West,C.A. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Analysis and design considerations for manufacturable and reliable 0.18-micron N-MOSFETs S. Krishnamurthy, S. Jallepalli, C.-F. Yeap, K. Hasnat, C.M. Maziar Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning Sturtevant,J.L., Allgair,J., Fu,C.-C., Green,K.G., Hershey,R.R., Kling,M.E., Litt,L.C., Lucas,K.D., Roman,B.J., … SPIE - The International Society for Optical Engineering
5 Conference Proceedings Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns Fritze,M., Wyatt,P.W., Astolfi,D.K., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., Denault,S., Chan,D., Shaw,J.C., … SPIE - The International Society for Optical Engineering	11 Conference Proceedings Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography Hsia,C.-C., Gau,T.-S., Yang,C.-H., Liu,R.-C., Chang,C.-H., Chen,L.-J., Wang,C.-M., Chen,J.F., Smith,B.W., Hwang,G.-W., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Characterization of gate electrode etch process for 0.25 ｦﾌm extended to 0.18 ｦﾌm Gerung,H., Chhagan,V.K., Yelehanka,P.R., Zhou,M.S., Hui,J.K.L. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Intrafield critical dimension variation using KrF scanner system for 0.18-ｦﾌm lithography Yim,D., Kim,H.-S., Baik,K.-H. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12