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Optimization of electron-beam lithography for super-low-noise HEMTs

Author(s):
Choi,S.-S. ( Electronics and Telecommunications Research Institute )
Lee,J.-H.
Yun,H.S.
Chung,H.B.
Lee,S.Y.
Yoo,H.J.
1 more
Publication title:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2723
Pub. Year:
1996
Page(from):
372
Page(to):
382
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420992 [0819420999]
Language:
English
Call no.:
P63600/2723
Type:
Conference Proceedings

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