Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure
- Author(s):
Choi,S.-S. ( Electronics and Telecommunications Research Institute ) Jeon,Y.J. Kim,J.-S. Chung,H.B. Lee,S.Y. Lee,J.H. Yoo,H.J. - Publication title:
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2723
- Pub. Year:
- 1996
- Page(from):
- 321
- Page(to):
- 331
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420992 [0819420999]
- Language:
- English
- Call no.:
- P63600/2723
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Probe-beam scan-type autofocus system using position-sensing detector for subhalf micrometer lithography tools
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Removal of Total Organic Carbon from Aqueous Phenol Solution Using Photocatalytic ZnO Nanopowders Prepared by Solution Combustion Method
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Fabrication of 0.15 ヲフm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography,
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Optical lithography technique with dummy diffraction mask for 0.20 µm T-shaped gate formation
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
Design of illumination aperture for ArF exposure system with wide exposing latitude
SPIE - The International Society for Optical Engineering |