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Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure

Author(s):
Choi,S.-S. ( Electronics and Telecommunications Research Institute )
Jeon,Y.J.
Kim,J.-S.
Chung,H.B.
Lee,S.Y.
Lee,J.H.
Yoo,H.J.
2 more
Publication title:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2723
Pub. Year:
1996
Page(from):
321
Page(to):
331
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420992 [0819420999]
Language:
English
Call no.:
P63600/2723
Type:
Conference Proceedings

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